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RITecC-Research Innovation and Technology Center for New Materials
National Institute of Materials Physics
Short link:
https://eeris.eu/
ERIF-2000-000T-0733
1826
Visits
RITECC is hosted in a new building. This is located on No. 105bis Atomistilor Street, Magurele city, has a footprint of 766.90 square meters and a built surface of 4116.80 sqm. The building has a D + P + 4E structure, with a maximum height of 21.50 m. The new construction is connected with the existing NIMP headquarters, via a skyline situated at the 1st level. RITECC has three new laboratories: -L1. Laboratory for production, processing and analyzing of functional materials for high-technolog...
Ionut
Enculescu
encu@infim.ro
Dr.
SCIENTIFIC TEAM
12
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Cristina CHIRILA
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Ionut ENCULESCU
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Alexandru EVANGHELIDIS
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Mihaela FLOREA
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Andrei GALATANU
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Corneliu GHICA
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Mihai MIHAIL
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Liviu NEDELCU
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George STAN
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Cristian Mihail TEODORESCU
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Andrei TOMULESCU
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Materials Synthesis or Testing Facilities
RI Domain of activity
Micro and Nanotechnology Facilities
RI Domain of activity
Analytical Facilities
RI Domain of activity
Research Data Management Plan:
No information available
Access Policy to Research Infrastructure and Related Services:
No information available
Research Services
Deposition of thin films (semiconductor, oxides, polymers, carbon)
SERVICE DESCRIPTION:
CVD machines can be used to deposit wide gap semiconductors (ZnO, GaN), polymers and carbon (carbon nanotubes, graphene). MAPLE system can be used to deposit nano-objects imersed in a dielectric or semiconductor matrix, or for deposition of oxide thin films (ferroelectrics, multiferroics).
SERVICE PERSONS:
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Cristina CHIRILA
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Processing materials and structures in a clean room environment
SERVICE DESCRIPTION:
Wafers up to 4 inch can be processed in the new clean room, starting with thin film deposition or nanomaterials fabrication, continuing with metallization, lithography (electrode patterning) and ending with basic electrical characterization.
SERVICE PERSONS:
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Ionut ENCULESCU
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Mihai MIHAIL
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Chemical analysis and investigation of physical properties
SERVICE DESCRIPTION:
Chemical analysis can be performed with the new high trough-output XPS system allowing experiments at high pressure and temperature, the gas cromatograph coupled with mass spectrometry; the thermoelectric properties can be also investigated.
SERVICE PERSONS:
Cristian Mihail TEODORESCU
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Structural investigation by transmission electron microscopy, including variable temperature and electron tomography
SERVICE DESCRIPTION:
A multifunctional tool designed for necessary research for advanced materials characterization, used for the following types of studies, investigations and experiments: conventional electron microscopy, electron microscopy, high-resolution electron tomography, in-situ electron microscopy at high temperature, in-situ electron microscopy at cryogenic temperatures, mapping diffractive microstructure by electron precession, reciprocal tomography, X-ray spectroscopy, elemental chemical mapping.
SERVICE PERSONS:
Corneliu GHICA
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Microstructural investigation by transmission electron microscopy, including variable temperature and electron tomography
SERVICE DESCRIPTION:
Advanced materials characterization by: conventional and high-resolution transmission electron microscopy, electron tomography, in-situ electron microscopy at high temperature, in-situ electron microscopy at cryogenic temperatures, structural phase mapping of crystalline materials by precession electron diffraction, chemical elemental analysis by EDS, compositional mapping by STEM-EDS.
SERVICE PERSONS:
Corneliu GHICA
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Characterization of the termoelectric properties of thin film and bulk materials
SERVICE DESCRIPTION:
Measurement of electrical conductivity, Seebeck coefficient and thermal conductivity for bulk and thin film thermoelectric materials. Determination of power factor and thermoelectric figure of merit, above the room temperature and up to 800 C.
SERVICE PERSONS:
Andrei GALATANU
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Printing of organics and ceramics
SERVICE DESCRIPTION:
Printing of organics and ceramics by spray coating, spray pyrolysis, screen printing, doctor blade, etc
SERVICE PERSONS:
Andrei TOMULESCU
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Alexandru EVANGHELIDIS
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Measurement of compression and bending strength-strain curves of bulk materials
SERVICE DESCRIPTION:
Measurement of compression and bending strength-strain curves of bulk materials
SERVICE PERSONS:
Andrei GALATANU
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Raman spectrometry measurements
SERVICE DESCRIPTION:
Raman spectrometry measurements using the 633nm/17 mW and 325 nm/25 mW laser kits.
SERVICE PERSONS:
Mihaela FLOREA
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FTIR (near-mid-far IR) spectroscopy measurements
SERVICE DESCRIPTION:
Fourier transform infrared spectrometry in an extended (near-mid-far IR domain) spectral range of 12000 - 30 cm–1 (DRIFT, ATR - diamond, integrating sphere with InGaAs detector, conventional (incidence angle 15 deg.) and VW specular reflection modes are available).
SERVICE PERSONS:
Liviu NEDELCU
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George STAN
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Research Equipment
High-resolution analytical electron micHigh-resolution analytical electron microscope by transmission with accessories for in-situ experiments and electron tomography
CATALOG NAME:
JEM 2100
DESCRIPTION:
Configuration: • LaB6 filament, 200 kV maximum accelerating voltage • Scanning unit by transmission electron microscopy (STEM) with dark field electron detector (Annular Dark Field Detector); • Energy dispersive X-ray spectrometer (EDS), fully integrated into the transmission microscope TEM / STEM; • High-resolution Olympus Tengra CCD camera • Single-tilt specimen holder, analytical double-tilt specimen holder; in situ heating holder, in situ cooling holder, electron tomography high-tilt holder; • Software platform for acquisition and processing of TEM / STEM images and EDS spectra; • TEM / STEM tomography kit for automated TEM / STEM image acquisition at predefined tilt angles, 3D image reconstruction and visualization.
PRODUCER:
JEOL Ltd., Japan
PRODUCTION YEAR:
2015
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (2097.07 kb)
Measurement of thermoelectric properties system
CATALOG NAME:
SBA 458 Nemesis
DESCRIPTION:
TECHNICAL SPECIFICATIONS • Allows characterizing both as bulk and thin films or coatings; • Allows investigations in vacuum, neutral atmosphere, reducing or oxidizing atmosphere; • Allows measurements on samples with different shapes and sizes without using additional connecting elements; • Allows measurements in the range of RT-800 oC, with different rates of temperature change; • Allows Seebeck measurements with alternative heating, by 2 heaters; • The equipment is fully automated and controlled by a computer that allows the scheduling and the recording of required measurements.
PRODUCER:
Netzsch, Germany
PRODUCTION YEAR:
2015
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Matrix assisted pulsed laser evaporation installation - MAPLE
CATALOG NAME:
DESCRIPTION:
TECHNICAL SPECIFICATIONS • Contains a carousel with 3 MAPLE targets cooled with liquid nitrogen, at a temperature of 100 K max.; • Automatic temperature and fluency control; • The substrate may be heated either during deposition or post-deposition, at a temperature of at least 800 °C, independent from the cooled targets; • Laser beam can scan targets over a range of at least 30 mm; • MAPLE targets can be manufactured also in-situ, by injection and freezing directly on the support from where it would be further sprayed.
PRODUCER:
SURFACE GmbH, Germany
PRODUCTION YEAR:
2015
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
XPS photoelectron spectroscopy unit with facilities for treatment of samples at high pressure and temperature
CATALOG NAME:
AXIS ULTRA DLD
DESCRIPTION:
TECHNICAL SPECIFICATIONS • The XPS equipment includes an airlock connected with high-pressure cell; • X-ray source: Al K alpha / alpha monochromatized L Ag single crystal using a focus with the spot size of 0.7 mm, Al K alpha spectral resolution (1.2) 0.2 eV; • Electron analyzer: hemispherical analyzer with a reference intensity of over 50,000 counts per second (cps) with a maximum spectral resolution of 0.7 eV, standard line of Ag 3d5 / 2 Ag metal or C 1s on the chart; • Sample treatment at high pressures and temperatures (treatment at maximum pressures of 5 bar, and at temperatures up to 300 oC and at a pressure of max. 1 bar in conditions of temperature up to 1000 °C ); • Microscopic system with CCD camera for monitoring the position of the sample; • Sample cleaning ion source, voltage 2 kV, the current 1mA; • Vacuum limit: 5 x 10-10 mbar; • Possibility to heat / cool the sample in the analysis chamber in (- 100 °C, 500 °C).
PRODUCER:
Kratos Analytical, United Kingdom
PRODUCTION YEAR:
2015
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Gas chromatograph with GC-MS mass spectrometer
CATALOG NAME:
GCMS QP-2010 ULTRA
DESCRIPTION:
TECHNICAL SPECIFICATIONS • Variable temperature in the RT-300 oC with high speed heating and cooling (100 oC / min), multiple-stage programmable temperature; • Injector, micro-syringe, AutoSampler; • BID type detector; • A quadrupolar mass spectrometer with a detector for both positive and negative ions, with the analyzed masses 2-1000 atomic mass units (amu); • 2004 NIST library spectra with about 200.000 spectra.
PRODUCER:
SHIMADZU HANDELSGESELLSCHAFT mbH, Austria
PRODUCTION YEAR:
2015
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
CVD equipment for deposition of thin layers of semiconductor materials with broadband type III-V and II-VI
CATALOG NAME:
Dli-CVD reactor 2 inch MC050
DESCRIPTION:
TECHNICAL SPECIFICATIONS • Substrate size: 2 inches; • Base vacuum in deposit chamber: minimum 10-5 mbar; • Substrate temperature of 1100 oC; • Lines for process gases: 6, with automatic control of flow; • Lines for process gases obtained by vaporizing of liquid phase: 3, with automatic control of liquid flow and with related carrier gas lines; • Glove box type interface (MBraun); • Automatic and computerized control of all process parameters, including recipes’ storage.
PRODUCER:
Annealsys, France
PRODUCTION YEAR:
2015
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
CVD equipment for deposition of carbon-based materials
CATALOG NAME:
Rapid Thermal Processor AS-One 100 HT
DESCRIPTION:
TECHNICAL SPECIFICATIONS • Substrate size: 2 inches; • Base vacuum chamber in deposit: minimum 10-5 mbar; • Substrate temperature of 1400 oC; • Gas Lines: 5, with flow control; • Automatic and computerized control of all process parameters, including recipes’ storage.
PRODUCER:
Annealsys, France
PRODUCTION YEAR:
2015
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
CVD equipment for deposition of polymer
CATALOG NAME:
DESCRIPTION:
TECHNICAL SPECIFICATIONS • Substrate size: 2 inches; • Base vacuum chamber in deposit: 10-5 mbar; • Substrate temperature: 550 oC; • Gas Lines: 2, with flow control; • Automatic and computerized control of all process parameters, including recipes’ storage.
PRODUCER:
Elettrorava Spa, Italy
PRODUCTION YEAR:
2015
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Electron lithography equipment - High resolution installation
CATALOG NAME:
ELPHY Quantum and Merlin Compact OEM
DESCRIPTION:
TECHNICAL SPECIFICATIONS • High resolution electron lithography equipment will combine high-resolution scanning electron microscope system for high resolution imaging and writing user-defined structures, design and control system, for achieving actual lithographic structures. Using electrons, the imaging system is high resolution based on an electron emission source type with better resolution than, or equal to 0.8 nm; • MERLIN Compact Base Unit with column GEMINI I, oil-free pumping system, microscope room with 3 ports for 3 EDS, automatic pendulum to prevent vibration, platform with 5 eucentric motorized axis and dual joystick control. The SE detector in the microscope room, DoF-module, scope chamber, carousel with support for 9 samples and 24“ TFT monitor; • XDS10 pumping system; • High-resolution configuration for the vacuum system with a Gemini I column and a 20nA sample current; • System integrated in the Gemini lense column I with 2 detection modes: the detection of secondary electrons and backscatter electron detection (parallel detection of SE and BSE electrons is not possible); • High accuracy Everhard Thornley secondary electron detector (replaces standard detectors). It allows a very high scan speed compared to standard detectors, but with the same ratio signal/noise; • Plasma Cleaner with integrated software and Smart SEM microscope software; • An EDX port adapter for DN40-KF (for attaching the Plasma Cleaner); • The imaging allows detection of secondary electrons and electron backscattering; • The system allows automatic correction of electron beam drift; • Lithography process control system provides ultra-high resolution that allows writing individual user-defined fields; it contains a beam blanker system (shutter beam) lithography experiments; • The system assures the control of high-resolution lithography processes, which allows writing to both individual user-defined fields and on a beam blanker system
PRODUCER:
Raith Nanofabrication, Germany and Carl Zeiss Microscopy GmbH, Germany
PRODUCTION YEAR:
2015
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Electrical properties measurements station
CATALOG NAME:
ST-500-(4CX-6 PORTS)
DESCRIPTION:
TECHNICAL SPECIFICATIONS • 4 XYZ manipulator arms with standardized connection point type elastic metal pin for contacting samples with varying sizes in plan, from 3 mm to 10 mm, and a thickness up to 2 mm; • Temperature range: 80-350 K with reproducible temperature control system; • Magnetic field range: up to at least 0.2 T (2000 gauss) permanent magnets.
PRODUCER:
Janis Research, USA
PRODUCTION YEAR:
2015
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Clean room (including five chemical niches, spin coater equipment, electric stoves with programmable temperature, RIE equipment and metallization equipment)
CATALOG NAME:
DESCRIPTION:
The Clean room is designed for research that is needed in order to obtain new heterostructures with applications in microelectronics, optoelectronics, renewable energy, advanced sensors, medicine, etc. The Clean room has an area of about 235 m2, from which 20 m2 Class 100 (ISO 5), 50 m2 Class 1000 (ISO 6) and 130 m2 Class 10,000 (ISO 7) and two lockers, one with an air shower. Between the premises of different classes, there are crossing systems which are installed in order to facilitate the transfer of samples. The HVAC system, the parameters monitoring and access control are automated and computer controlled. Chemical niches are equipped with running water, ultrapure deionized water dispenser, Millipore Q-bridge type, and blow dry N2 gun.
PRODUCER:
Imgrad, Slovenia
PRODUCTION YEAR:
2015
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Multi-gun (AJA Phase II J model derived) magnetron sputtering (RF, DC, pulsed DC) deposition system with multiple facilities
CATALOG NAME:
AJA Phase II J
DESCRIPTION:
Equipped with four 2 inch magnetron sputtering guns in con-focal orientation and one 3 inch central magnetron sputtering gun for direct deposition orientation, four AJA International RF generators (1 x 150 W, 2 x 300 W, 1 x 600 W), one one TruPlasma DC 4002 Pulsed DC Power Supply (2 kW Output Power, 800 V Output Voltage, 2.5 A Output Current, 0-100 kHz Output Frequency), and one AJA 750 W DC source. The magnetron guns are designed to assure high uniformity (±1.5 %) on 4 inch wafers. The vacuum system enables attaining a min. 2x10-7 mbar base pressure in the reactor chamber. Facilities: load lock chamber (with cassette for in-situ mask exchange), substrate holder (rotation 0 – 40 rpm, radiant heating up to 850°C, RF/DC biasing, substrate plasma etching), custom planetary style interchangeable substrate carrier capable of indexing up to 6 substrates individually for uniform coating of 3D pieces, quartz crystal thickness monitor, computer control of all processes, closed-loop chiller.
PRODUCER:
AJA International Inc
PRODUCTION YEAR:
2016
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Four-mirror optical floating zone furnace with halogen lamps
CATALOG NAME:
FZ-T-4000-H-VIII-VPO-PC
DESCRIPTION:
Maximum Temperature 2200C, Normal Use Temperature 1800C. It can be used for growth of single crystals of various materials.
PRODUCER:
Crystal Systems Corporation, Hokuto, Yamanashi, Japan
PRODUCTION YEAR:
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Vertical Furnace with Rotational Lifter
CATALOG NAME:
VEF-1800-BR
DESCRIPTION:
VEF-1800-BR is the combination of Vertical High Temperature Molysili Furnace and Rotational Lifter. It can produce the straight sintered sample rod of uniform sintered density which is the best suitable for Optical Floating Zone Furnace. It can also be used as a Bridgeman crystal growth furnace.
PRODUCER:
Crystal Systems Corporation, Hokuto, Yamanashi, Japan
PRODUCTION YEAR:
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Universal Mechanical Testing System
CATALOG NAME:
INSTRON 5982
DESCRIPTION:
Used for investigation of mechanical properties (compression/bending). Maximum force – 100 kN, equipped with Applied Test Systems furnace (up to 1700 °C) Service description: Measurement of compression and bending strength-strain curves of bulk materials (bars/cylinder/others) from RT to 1700 °C.
PRODUCER:
INSTRON USA
PRODUCTION YEAR:
2017
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Printer for Successive Deposition of Ultra-Thin Layers of Different Physical-Chemical Properties - PERPHECT
CATALOG NAME:
DESCRIPTION:
TECHNICAL SPECIFICATIONS • Presents a modular design enabling the use of multiple deposition techniques such as: spray coating, spray pyrolysis, screen printing, doctor blade, robocasting, etc.; • 4 axes of movement with computer control of individual position and speed (accuracy under 10 μm); • Possibility of deposition on large area, up to a A4 area; • Deposition of films of a multitude of materials (organics, ceramics, etc) with a wide range of thicknesses (starting from 30 nm), using a verity of precursors like solutions, suspensions, pastes, etc.
PRODUCER:
Optoelectronica 2001 SA, Romania
PRODUCTION YEAR:
2017
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Stereolithography 3D printing equipment
CATALOG NAME:
Formlabs Form 2 SLA 3D printer with Formlabs Cure resin curing device
DESCRIPTION:
The Formlabs Form 2 is a desktop 3D printer based on laser stereolithographical (SLA) technology capable of down to 140/25 um lateral/vertical printing resolution, with a maximum build volume is 145 × 145 × 175 mm. The manufacturer offers a wide range of resin cartridges for rigid, flexible or even ceramic prints and the printer also has an open mode where the user can provide their own materials. The Formlabs cure is a dedicated post-processing system which is optimized for curing the Formlabs proprietary polymer materials using temperature (up to 80°C) and UV light (405 nm).
PRODUCER:
FORMLABS, USA
PRODUCTION YEAR:
2018
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Raman Spectrometer
CATALOG NAME:
LabRAM HR Evolution
DESCRIPTION:
DESCRIPTION: It uses large sample holders like cryostats, high temperature cells, high pressure cells, or just large samples. In order to get high stability, the sample stage is hard coupled to the LabRAM HR, while focusing is achieved by adjusting the height of the microscope objectives instead of the sample stage. This microscope offers all the functions of the standard microscope. It includes: • high throughput achromatic coupling optics optimized to work from UV to NIR with maximum efficiency; • Open Electrode CCD air-cooled to –60 °C, 3 objectives 5×, 10× and 100× and 2 gratings; • HeNe laser kit 633nm/17 mW, including the Helium Neon laser internally mounted, the Edge and bandpass filters set at 633 nm for measurements from 50 cm-1 and the motorized switching system to allow the laser commutation fully controlled by LabSpec 6 software; • 325 nm laser kit, including Air cooled He-Cd lasers, 325 nm / 25mW, Edge and bandpass filters set at 325 nm for Raman measurements from 150 cm-1 to 4000 cm-1, controlled by LabSpec 6 software, one column with the necessary motorized coupling optics for injecting the beam of an external UV laser in the instrument. 40× NUV objective, NA = 0.50, WD = 1 mm, 2400 gr/mm holographic grating blazed at 330 nm (spectral range 190–650 nm) with pre-aligned holder, calibration and tests; • Full kit for Micro thermometric cell working from –196 °C to 600 °C controlled by software, with the following specifications: o Sample area: 22 mm diameter; o Light aperture: 2 mm, with 16 mm X-Y sample manipulation; o Stage body size: 137 × 92 × 22 mm; o Gas tight chamber for atmospheric control; o Water cooled stage body for high temperature measurements; o Liquid N2 cooling device for low temperature measurements.
PRODUCER:
HORIBA Scientific
PRODUCTION YEAR:
2019
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (268.75 kb)
JASCO FTIR spectroscopy platform (near-mid-far IR) - spectral range 12000 - 30 cm-1
CATALOG NAME:
JASCO
DESCRIPTION:
Fourier transform infrared spectrometry platform able to access an extended (near-mid-far IR domain) spectral range of 12000 - 30 cm–1 (DRIFT, ATR - diamond, integrating sphere with InGaAs detector, conventional (incidence angle 15 deg.) and VW specular reflection modes are available).
PRODUCER:
JASCO, Inc.
PRODUCTION YEAR:
2020
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
100.001 € – 500.000 €
DATA SHEET:
Robocasting 3D printing system
CATALOG NAME:
Nordson EFD (EV series) equipped with Ultimus V high-precision dispensing system
DESCRIPTION:
The Nordson 3-Axis EV Series Automated Fluid Dispensing tabletop Robot equipped with the Ultimus™ V high precision air-powered fluid dispenser delivers facile automation for precise fluid/paste extrusion and deposition, while the proprietary DispenseMotion™ dispensing software and the simple vision pencil camera, makes it easy to setup and program complex applications.
PRODUCER:
Nordson Corporation
PRODUCTION YEAR:
2020
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
10.001 € – 50.000 €
DATA SHEET:
Phone:
+40-(0)21-2418100
Fax:
Atomistilor
,
405A
,
Magurele
077125
,
Ilfov
Romania
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