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Research Centre for Advanced Surface Processing and Analysis by Vacuum Technologies
National Institute of R&D for Optoelectronics
Short link:
https://eeris.eu/
ERIF-2000-000K-1489
784
Visits
The ReCAST activity is mainly related to: thin film Physical Vapor Deposition (dc, rf, pulsed bipolar magnetron sputtering, cathodic vacuum arc, thermal evaporation) with associated characterization methods; plasma surface treatments; ultrahigh vacuum (UHV) technologies, including leak detection by mass spectrometry; ion sources for ion assisted surface processing. Thin film deposition research activities were developed in the last four years especially due to potential applicati...
Catalin
VITELARU
catalin.vitelaru@inoe.ro
Dr.
SCIENTIFIC TEAM
1
Catalin VITELARU
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Materials Synthesis or Testing Facilities
RI Domain of activity
Micro and Nanotechnology Facilities
RI Domain of activity
Analytical Facilities
RI Domain of activity
RI Category
IOSIN
Type Of RI:
Single sited RI
RI Life Cycle Status:
Active RI
Research Data Management Plan:
No information available
Access Policy to Research Infrastructure and Related Services:
No information available
Research Services
Elemental and morphological analysis of materials and surfaces
SERVICE DESCRIPTION:
Investigation of elemental composition and morphology of materials, using medium resolution (SEM-EDX tabletop Hitachi TM3030) and high resolution ( NanoSam-Lab with HR-SEM and AES) systems. The compositional analysis can be performed on solid materials and thin films compatible with high vacuum conditions. By combining it with morphological analysis, it allows to corelate the composition and morphological characteristics of the surface.
SERVICE PERSONS:
Catalin VITELARU
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Research Equipment
Scanning Electron Microscope (SEM) with Energy Dispersive X-ray spectrometer (EDX)
CATALOG NAME:
TM 3030 Plus
DESCRIPTION:
SEM-Hitachi Tabletop Microscope TM3030 Magnification: 15 to 30,000x (digital zoom: 2x, 4x) Observation condition: 5kV/15kV/EDS Observation mode: Conductor; Standard Mode; Charge-up reduction mode Image mode: COMPO/Shadow 1/Shadow 2/TOPO Maximum sample size: 70mm in diameter Maximum sample height: 50mm Electron gun: Pre-centered cartridge filament Detector: High-sensitivity semiconductor backscattered electron detector Recording pixels: 1280x960 pixels(max)/640x480 pixels Data display: Micron marker, micron value, date and time, image number, image mode, observation condition, distance, observation mode Energy Dispersive X-ray spectrometer (EDS) EDS System for Hitachi Tabletop Microscope TM3000 QUANTAX 70 Analyzing modes: Spot, Line, Mapping Image size: Large: 1024 x 768 Pixel, Normal: 640 x 480 Pixel, Small: 320 x 240 Pixel Element identification: both “Auto mode” and “Advanced Element Identification” available Quantification results available as: net counts, mass percent, mass percent (normalized), atomic percent
PRODUCER:
Hitachi
PRODUCTION YEAR:
2014
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Nanoindenter Hysitron TI Premier
CATALOG NAME:
TI PREMIER SYSTEM
DESCRIPTION:
Nanoindentation • Normal Load Range: 70 nN to 10 mN • Normal Displacement Range: 2 A to 5 μm Nanowear • Maximum Load: 100 μN Integrated In Situ SPM Imaging • Performed with same probe as mechanical characterization • Imaging Force: <70 nN Indentation probes • Berkovich 142.3o, 100 nm tip radius • Conical, 60o, 5mm tip radius Optics • Magnification: 10X • Top-Down Configuration Typical sample size • 0.5 to 5 cm witdh • to 5 cm height Applications: Polymers, Metals, Nanostructures, Alloys, Thin Films
PRODUCER:
Hysitron
PRODUCTION YEAR:
2015
COMMISSIONING DATE:
DATA SHEET:
TriboLab UMT Bruker
CATALOG NAME:
TriboLab
DESCRIPTION:
Universal Mechanical Tester Measurement Capability: Universal mechanical and tribology testing System Specifications: Integrated high-speed/high-torque drive motor; Servo-controlled, precision Z-axis load stage; Motorized positioning “lateral” stage; Tool-less lower drive retaining system; 8 data channels (expandable to 16 channels), 16-bit DAS up to 200 kHz; Auto-recognition Tribo ID technology; Built-in temperature controller Software : TriboScript tribology scripting software; Viewer data analysis package Vertical Travel: Distance: 150 mm; Encoder resolution: 0.5 μm; Speed: 0.002 to 10 mm/s Lateral Travel: Distance: 120 mm; Encoder resolution: 0.25 μm;Speed: 0.002 to 10 mm/s Load Range: 1 mN to 2000 N Torque Capability: 5 Nm @ 100 rpm, 2.5 Nm @ 5.000 rpm Temperature Control: -25 C to 1000 C Applications: Lubricants testing Testing of thin films and coatings Glass strength and scratch resistance Oil and gas refinery applications Measuring very low friction forces High-temperature materials testing Stress-strain-bend testing Hardmetals and hardfacings testing
PRODUCER:
Bruker
PRODUCTION YEAR:
2015
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
X-Ray Diffractometer SmartLab
CATALOG NAME:
SmartLab X-Ray Diffractometer
DESCRIPTION:
SmartLab specifications: • Rotating anode generator: Maximum rated output: 9 kW (45kV, 200mA), Cu target Focus size: 0.4 x 8 mm line/point • Goniometer: 5-axis Vertical goniometer with horizontal sample positioning, 300 mm radius Scanning mode: θs/θd coupled or θs, θd independent optical encoder controlled In-plane scattering arm • Optics: Focusing (Bragg-Brentano) or parallel beam diffractometer geometries; selection via Cross Beam Optical (CBO) technology different monochromators/analyzers : Ge(220) 2/4 bounce monochromator, Ge(440) 4 bounce monochromator, Ge(220) 2 bounce analyzer, focussing/flat diffracted beam monchromator variable divergence, scattering and receiving slits -automatic optics and sample alignment • Detector NaI Scintillation counter HyPix-3000 Hybrid Pixel Array Detector • Accessories: Sample stages: Rx-Ry tilt stage; X-Y mapping stage Anton Paar DHS 1100 Domed Hot Stage (temperature range: 25 °C to 1100°C; atmospheres: air, inert gas, vacuum) Capillary attachment for SAXS/USAXS • Multiple measurement techniques: X-ray Powder diffraction (XRPD); High resolution X-ray diffraction (HRXRD) X-ray reflectometry (XRR) – thickness, roughness and density evaluation of individual layers of a multilayer thin film structure Grazing incidence diffraction (GIXRD) -diffraction technique for very thin film layers In-plane grazing incidence diffraction (IPGID) - true in-plane diffraction technique for ultra thin films down to monolayer size Small angle X-ray scattering (SAXS) – particle/pore size analysis Single crystal diffraction (SCD) – HR x-ray rocking curves (HR-XRC), HR reciprocal space mapping (HR-RSM), pole figures for single crystalline bulk or thin films
PRODUCER:
Rigaku
PRODUCTION YEAR:
2015
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Nano SAM Lab S Scanning Auger Microscopy System
CATALOG NAME:
Nano SAM Lab S
DESCRIPTION:
The system is equiped with: - UHV Gemini column for outstanding SEM imagery, - NanoSAM electron energy analyser – HEA , - floating column ion gun, - NanoSAM 5-axis sample stage, - FIB The guaranteed lateral SAM resolution is 6 nm at 10 keV beam energy, and 10 nm at 5 keV. The NanoSAM hemispherical energy analyser features multichannel detection, a wide acceptance angle, and a variable energy resolution. The UHV Gemini column offers outstanding SEM functionality with an ultimate resolution below 3 nm under true UHV conditions and is optimised for superior performance at low beam voltages down to 100 eV and high beam currents up to 50 nA. In addition to the in-lens secondary electron detector, a separate external SED is provided for contrast enhancement and operation above 20 keV beam energies. The hemispherical electron energy analyser is optimised to work in conjuction with the Gemini column for AES analysis. The floating column ion gun provides low energy argon ions for charge neutralisation on insulators surface and also high energy ion beam for depth profiling in combination with AES analysis. The NanoSAM 5-axis sample stage has been designed for superior stability, 25mm diameter sample size, heating up to 1000K and eucentric tilt with a high-precision goniometer, enabling flexibility and performance for combination with various optional analytical methods such as angle-resolved SEM and Auger measurements, FIB, etc. The UHV system is designed to meet the stringent requirements of the SEM, SAM and FIB operating modes.
PRODUCER:
OMICRON
PRODUCTION YEAR:
2013
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Veeco DEKTAK 150 Surface Profilometer
CATALOG NAME:
Dektak 150 Veeco
DESCRIPTION:
Measurement capability: two-dimensional (2D), contact surface profile measurements; Sample surface characterizations: 2D surface roughness, step height measurements, three-dimensional (3D) mapping, film stress analyses; Sample Viewing: 640 x 480-pixel camera, manual variable zoom (100x - 644x with 17” monitor) Sample Stage: X-Y motorized stage, 150 mm travel, 1 µm repeatability, 0.5 μm resolution; 360° manual rotation, manual leveling; Scan length range: 50 µm - 55 mm; Data points per scan: 120 kpoints max.; Stylus Sensor: low-inertia sensor (LIS 3) Stylus Force: 1 - 15 mg; Vertical range: up to 1 mm; Vertical resolution: 1 Å max. (at 6.55 µm range); Step height repeatability: less than 6 Å; 1 sigma on 0.1µm step; Available stylus: diamond-tipped L stylus with 2.5 µm and 12.5 µm radius; Available depth standards: nominal depth of 50 nm, 1 µm and 900 µm; Available software: Dektak software; Step Detection software;Stress Measurement software; 3D Mapping with Vision analysis software; Vibration isolation: TMC airless table-top vibration isolation platform.
PRODUCER:
Veeco-Bruker
PRODUCTION YEAR:
2007
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
AFM/STM Microscopy System
CATALOG NAME:
Atomic Force Microscope System INNOVA VEECO
DESCRIPTION:
AFM/STM Microscopy System INNOVA VEECO working in contact and tapping mode, phase imaging: Conductive AFM Module Electrostatic Force Microscopy Module Scanning Capacitance Microscopy Module Force Modulation Microscopy Module Surface Potential Module Force-Distance Measurements, Magnetic Force Microscopy, Scanning Tunneling Microscopy
PRODUCER:
VEECO
PRODUCTION YEAR:
2008
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Auger Electron Spectroscopy (AES) – Modular PHY system
CATALOG NAME:
PHI Model – 3017
DESCRIPTION:
The Auger electron spectrometer (PHI Model – 3017) has the following specifications: - Electron energy analyzer: Type : Single-pass Cylindrical Mirror Analyzer (CMA) Electron multiplier : Cu-Be Channeltron Energy range : to 3200 eV Energy resolution : 0.6 % Beam energy : 0.1 ~ 5 KeV Electron gun type : Electrostatic, fixed beam Beam current : > 50 µA Electron gun control : Beam voltage range control : 0 ~ 5000 V Emission current range and control : 0 ~ 6 mA - Analyzer Control : Energy range : 0 ~ 3200 eV Resolution : 50 meV/step Energy sweep rate : 2msec/eV
PRODUCER:
PRODUCTION YEAR:
2006
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
X-ray Difractometer MiniFlex-II
CATALOG NAME:
Rigaku Miniflex II
DESCRIPTION:
X-ray tube: Cu target, 1.0 kW, Normal Focus, 1.0 mm x 10.0 mm focus size -Vertical goniometer, 150 mm radius -θ-2θ Scanning mode -Scanning range (2θ): up to 145° -Scanning speed (2θ): up to 100°/min -Accuracy (2θ): 0.01° -Cu-Kα monochromator (1.5418 Å): Curved Graphite (002) counter-type monochromator -Scintillation counter NaI(Tl) as X-ray Detector
PRODUCER:
Rigaku
PRODUCTION YEAR:
2009
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
V-670 UV-Vis/NIR Spectrophotometer
CATALOG NAME:
V-670 UV-Vis/NIR
DESCRIPTION:
Optical system: Single double-beam type monochromator, Czerny-Turner mount, equipped with two gratings (1200 grooves/mm for the UV/VIS region; 300 grooves/mm for the NIR region), automatically exchanged at 850 nm. - Light sources: Deuterium and Halogen lamps - Detectors: Photomultiplier tube and Peltier cooled PbS detector for UV-Vis and NIR regions, respectively. - Wavelength range: 190 - 3200 nm - Spectral bandwidth: 0.1 to 10 nm (UV-Vis region); 0.4 - 40 nm (NIR region) - Scanning speed: 10 - 4000 nm/min Accessories: 1. Jasco ILN-725, 150mm Integrating Sphere for diffuse reflectance and transmittance measurements - Wavelength range 250 - 2500 nm - Photomultiplier tube and PbS detectors 2. Jasco ARSN-733, Absolute reflectance measurement accessory - Wavelength range: 250 - 2000 nm - Bandwidth: minimum 5 nm for UV-Vis range and 20 nm for NIR range - Angle of incidence: 0º – 60º for transmittance measurements and 5º – 60º for absolute reflectance measurements. - Uses a 60 mm-dia. integrating sphere with Photomultiplier tube and PbS detectors
PRODUCER:
Jasco
PRODUCTION YEAR:
2007
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Jasco FT-IR-6300 Fourier Transform Infrared Spectrometer
CATALOG NAME:
FT-IR-6300
DESCRIPTION:
Single beam optical system with high intensity ceramic light source; - Wavenumber range: 7800 – 150 cm-1; - Wavenumber resolution / accuracy: 0.07 cm-1 / ± 0.01 cm-1; - Interferometer system: 28° Michelson interferometer with auto-alignment mechanism, sealed structure, and gold coated mirrors; - Secure-lock beam splitter catch system with auto-alignment mechanism; - Available Beam Splitters: Ge/KBr (7800 – 400 cm-1) and Mylar-5 (600 – 150 cm-1); - KRS-5 and PE interchangeable windows of the sample compartment; - Peltier temperature control of the detector system with automatic detector exchange mechanism; - Available detectors: DLATGS (7800 – 360 cm-1) and DTGS(PE) (450 – 150 cm-1); - Up to two more external detectors may be installed via the external detector port. Accessories: 1. Pike MIRacle – universal ATR sampling accessory - Available crystals: Si (7800 – 1500 cm-1, 475-150 cm-1) Si/ZnSe (7800 – 550 cm-1) 2. Pike Mid-IR IntegratIR – 3 inch diameter Au coated integrating sphere used for the measurement of absolute and relative diffuse reflectance - LN2-cooled MCT detector; - Wavenumber range: 7800 – 550 cm-1.
PRODUCER:
Jasco
PRODUCTION YEAR:
2008
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Hall Measurement System
CATALOG NAME:
HMS-3000
DESCRIPTION:
The HMS-3000 Hall Measurement System is a complete four point Van der Pauw method system for measuring the resistivity, carrier concentration, Hall coefficient, magneto-resistance and carrier mobility of semiconductors. The systems can be used to characterize various materials including semiconductors and compound semiconductors (n & p type), metals, at both 300 K and 77 K. The system can accommodate small (6mm x 6mm) and large (20mm x 20mm) samples. The system contains several modules: - constant current supply source and voltmeter; - sample measurement case; - permanent magnet set; - funnel for liquid nitrogen measurements - specific software (Windows compatible) Measurement ranges: - resistivity range: 10-4 to 107 Ohms-cm - Hall voltage range: 1µV to 2000 mV - mobility: 1 to 107 cm2/V.s
PRODUCER:
Ecopia
PRODUCTION YEAR:
2008
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Contact angle measurement system
CATALOG NAME:
Optical Tensiometer THETA LITE TL 101
DESCRIPTION:
Drop shape analysis device is mainly used for determination of surface free energy of coatings. Range 2.00 to 16.00 pH; -9.9…120 0C Resolution 0.001pH; 0.10C Accuracy ±0,002 pH; ±0,40C Automatic pH Calibration Probe HI 1131B glass body pH electrode and HI 7662 stainless steel temperature Environment 0 to 50°C; RH max 95% Windows compatible software
PRODUCER:
ATTENSION
PRODUCTION YEAR:
2011
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
VersaSTAT-3 potentiostat/galvanostat
CATALOG NAME:
VersaSTAT 3
DESCRIPTION:
The VersaSTAT-3 potentiostat/galvanostat combines an electrochemistry cell and probe cartridge designed for AFM/STM microscopy system Innova (Veeco). The module permits in situ Contact mode or STM studies of surfaces in a controlled electrochemical environment. Scans and electrochemical measurements can be taken simultaneously using V3 Studio Electrochemical software package . The following groups of techniques are available: Corrosion providing multiple corrosion analysis techniques such as LPR, Tafel, cyclic polarization, etc. Voltammetry providing basic and advanced scan, step and pulse electrochemical techniques. Voltage Control (potentiostat mode): Voltage range ±10V Voltage resolution 300nV, 3µV, 30µV, 300µV Maximum scan range ±10V / 300µV Current Control (galvanostat mode): Current range ±650mA (standard), ±2A (optional) Current resolution ±1/32,000 x full scale Current accuracy ±0.2% of reading value Min. current range /resolution: ±200nA / 60 pA
PRODUCER:
Princeton Applied Research
PRODUCTION YEAR:
2009
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
ORION – AJA UHV deposition unit
CATALOG NAME:
ORION – AJA UHV
DESCRIPTION:
ORION – AJA UHV deposition unit: 5 magnetrons (2” diam.) in confocal geometry 3 RF supply sources 2 DC supply sources p (residual) ~ 10-6 Pa rough and turbomolecular pumps T (substrate) – RT – 1100 K
PRODUCER:
AJA International
PRODUCTION YEAR:
2008
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
OXI – AJA UHV deposition unit
CATALOG NAME:
OXI – AJA UHV
DESCRIPTION:
OXI – AJA UHV deposition unit 3 magnetrons (1” diam.) in confocal geometry 3 RF supply sources 2 DC supply sources p (residual) ~ 10-6 Pa rough and turbomolecular pumps T (substrate) – RT –1100 K
PRODUCER:
AJA International
PRODUCTION YEAR:
2008
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Laboratory Octogon deposition unit
CATALOG NAME:
Octogon
DESCRIPTION:
Laboratory Octogon deposition unit 1 magnetron (2” diam.) 1 RF supply source 1 DC supply source 1 HiPIMS source rough and diffusion pumps p (residual) ~ 10-4 Pa T (substrate) – RT – 500 K
PRODUCER:
PRODUCTION YEAR:
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Cathodic arc deposition unit
CATALOG NAME:
DESCRIPTION:
Cathodic arc deposition unit: 3 cathodes (160 mm diam.) p (residual) ~ 10-4 Pa rough, Roots and diffusion pumps T (substrate) – RT – 550 K
PRODUCER:
PRODUCTION YEAR:
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Thermal/ Electron beam evaporation unit
CATALOG NAME:
DESCRIPTION:
Thermal/ Electron beam evaporation unit boats/crucible evaporators 4 pocket 6kV electron beam evaporator in situ optical thickness monitoring p (residual) ~ 10-4 Pa rough, Roots and diffusion pumps T (substrate) – RT – 550 K
PRODUCER:
PRODUCTION YEAR:
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Plasma – nitridation unit
CATALOG NAME:
DESCRIPTION:
Plasma – nitridation unit: 5 kW DC supply source p (residual) ~ 1 Pa rough pumping unit with pressure control valves T (substrate) – max 900 K
PRODUCER:
PRODUCTION YEAR:
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Plasma investigation equipments
CATALOG NAME:
DESCRIPTION:
Plasma investigation: Electrical probes RF mass spectrometry – with differential pumping Optical emission spectroscopy (DC and pulsed plasma)
PRODUCER:
PRODUCTION YEAR:
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Vacuum technologies equipments
CATALOG NAME:
DESCRIPTION:
Vacuum technologies: Mass spectrometry systems for He leak detection Clean High Vacuum brazing unit Edwards Calibration unit for vacuum gauges Plasma/laser welding and manufacturing workshop
PRODUCER:
PRODUCTION YEAR:
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
OptiLayer Thin Film Software
CATALOG NAME:
OptiLayer v10.48d
DESCRIPTION:
OptiLayer software package includes three main modules (OptiLayer, OptiChar, and OptiRe). The OptiLayer module is specialized in designing of all types of multilayers with various optical properties (anti reflection coatings, high reflectors, optical filters, color coatings, etc). It also can be used in evaluation, pre-production error analysis and computational manufacturing of optical coatings. The other two modules (OptiChar and OptiRe) are used for post-production characterization of mono- and multilayer optical coatings respectively, on the basis of spectral photometric or/and ellipsometric measurements.
PRODUCER:
OptiLayer GmbH
PRODUCTION YEAR:
2015
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Phone:
0214574522
Fax:
https://recast.inoe.ro/
Atomistilor
,
409
,
Magurele
077125
,
Ilfov
Romania
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