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Low Temperature Plasma Physics Department
NATIONAL INSTITUTE FOR LASER, PLASMA AND RADIATION PHYSICS - INFLPR
Short link:
https://eeris.eu/
ERIF-2000-000P-1003
1176
Visits
Low Temperature Plasma Physics Department focuses its thematic on fundamental and applicative research on gas discharges, plasma processes for obtaining thin films, functionalized materials and surfaces, development of plasma sources for their utilization in the smart specialization and public priority fields. The wide expertise of the personnel is proved by publications, patents and constant participation to national and international research projects. The laboratory comprises of four resea...
Corneliu
Porosnicu
corneliu.porosnicu@inflpr.ro
PhD
SCIENTIFIC TEAM
5
Cristian Lungu LUNGU
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Gheorghe DINESCU
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Cristian LUNGU
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Corneliu POROSNICU
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Cristina SURDU BOB
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Micro and Nanotechnology Facilities
RI Domain of activity
Materials Synthesis or Testing Facilities
RI Domain of activity
Plasma Sources and Applications, Plasma Diagnostics, Plasma Surface Engineering
RI Domain of activity
Type Of RI:
Distributed RI
RI Life Cycle Status:
Active RI
Research Data Management Plan:
No information available
Access Policy to Research Infrastructure and Related Services:
No information available
Research Services
Thin films coatings using TVA
SERVICE DESCRIPTION:
Thin films coatings using TVA (Thermionic Vacuum Arc) deposition technique used for the deposition sample and composite thin films (up to three materials) in ultra-high vacuum conditions (10E-6 Torr) on a large range of substrates including thermal sensitive substrates. 0,1-10000 nm high purity , low roughness and very good adherence to the substrate of the deposited layers.
SERVICE PERSONS:
Cristian Lungu LUNGU
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Thin films coatings using Reactive Magnetron Sputtering
SERVICE DESCRIPTION:
Thin films coatings using Reactive Magnetron Sputtering Available in two different configurations: Direct Current Magnetron Sputtering and High Power Impulse Magnetron Sputtering, this techniques are employed for the sputtering of metallic and insulator targets. Also by sputtering metallic targets in the presence of reactive gas makes it possible to form compound layers such as nitrides, oxides, carbides and their combination.
SERVICE PERSONS:
Corneliu POROSNICU
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Thermal Desorprion Spectrometry measurements
SERVICE DESCRIPTION:
Thermal Desorprion Spectrometry measurements is used for the study of kinetic and thermodynamic parameters of desorption processes and decomposition reaction by heating a sample with an oven from room temperature to 1300K with a linear heating ramp betwen 0.1 and 15K/min and measuring in situ, the partial pressures of atoms and molecules released from materials by means of mass spectrometry.
SERVICE PERSONS:
Corneliu POROSNICU
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Tribology Measurements
SERVICE DESCRIPTION:
Determination of friction coefficient and tribological properties of the materials using a ball on disk tribometer using a normal load 0-5N and programmable sliding distance and linear speed.
SERVICE PERSONS:
Cristian LUNGU
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OES Measurements
SERVICE DESCRIPTION:
Determination of electron temperature assuming LTE and ion identification base on emission spectral lines.
SERVICE PERSONS:
Cristian Lungu LUNGU
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Thin Film Deposition
SERVICE DESCRIPTION:
Deposition of metal, oxide, nitride and carbide thin films using an anodic high voltage plasma in vacuum (Thermionic Vacuum Arc). Max thickness 5 microns. Possible substrates: metal, semiconductor, ceramic, plastic.
SERVICE PERSONS:
Cristina SURDU BOB
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Synthesis of metal spherical particles
SERVICE DESCRIPTION:
Synthesis of metal spherical particles of diameters in the range 30 - 1000 microns made of almost any metal in the Periodic Table of Elements, as well as metal alloys.
SERVICE PERSONS:
Cristina SURDU BOB
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Sand blasting of metal surfaces
SERVICE DESCRIPTION:
Sand blasting of metal surfaces using standard beads for surface roughening.
SERVICE PERSONS:
Cristina SURDU BOB
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Increasing the wetting and dying capabilities of plastics
SERVICE DESCRIPTION:
Increasing the wetting and dying capabilities of plastics, available for laboratory-scale area processing, including textiles, foils and irregular 3D surfaces.
SERVICE PERSONS:
Gheorghe DINESCU
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Surface cleaning of organic residuals
SERVICE DESCRIPTION:
Surface cleaning of organic residuals, available for laboratory-scale area processing, including 2D and 3D processing.
SERVICE PERSONS:
Gheorghe DINESCU
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Plasma cleaning of “graffiti” paintings on hystorical monuments and buildings
SERVICE DESCRIPTION:
Plasma cleaning of “graffiti” paintings on hystorical monuments and buildings is made by a portable system wich is available for large area processing .
SERVICE PERSONS:
Gheorghe DINESCU
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Monodisperse nanometric powders for toxicology studies
SERVICE DESCRIPTION:
Monodisperse nanometric powders for toxicology studies, various materials, metals and oxides.
SERVICE PERSONS:
Gheorghe DINESCU
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Vertically arranged graphenes with high surface area
SERVICE DESCRIPTION:
Vertically arranged graphenes with high surface area.
SERVICE PERSONS:
Gheorghe DINESCU
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Research Equipment
Fourier Transform Infrared Spectrometer
CATALOG NAME:
FT/IR-6300 Spectrometer
DESCRIPTION:
Fourier Transform Infrared Spectrometer (FTIR) represent an instrument for chemical analysis of various materials (solids, liquids and gases) which are transparent in infrared radiation. This device has three operation modules: one, in transmission mode, one for attenueted total reflection (ATR) mode and another one, for specular reflectance measurements. The ATR and Specular Reflectance are ideal for chemical analysis of the materials surface.
PRODUCER:
JASCO Corporation
PRODUCTION YEAR:
2007
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (344.43 kb)
Atomic Force Microscope
CATALOG NAME:
Q-Scope TM 250
DESCRIPTION:
Atomic Force Microscope (AFM) is a device for surface analysis of various materials, operating in non- contact, contact, and tapering mode. This microscope is for small area measurements, with a maximum area of about 44 x 44 microns and a minimum range of about 130x130nm.
PRODUCER:
Quesant Instrument Corporation
PRODUCTION YEAR:
2002
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Profilometer
CATALOG NAME:
Surface Profiler- P-7
DESCRIPTION:
Surface Profiler P-7 from KLA-Tencor Corporation represents an instrument for large surfaces (horizontal scan stage of about 150mm and vertical range up to 327 microns) measurements. The stylus has 2 microns size, and is from diamond material. This profiler operates in contact mode. http://www.kla-tencor.com/Surface-Profiling/p7.html
PRODUCER:
KLA-Tencor Corporation
PRODUCTION YEAR:
2016
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
High Resolution Spectrograph
CATALOG NAME:
FHR1000 Jobin Yvon
DESCRIPTION:
Devoted for spectral plasma diagnostics. Designed for researchers who require high accuracy with immediate results, the Versatility of the FHR allows for utilization over a wide spectral range, extending from the UV to the IR. The instrument's cast body design accounts for temperature induced stress and expansion, preventing any significant wavelength shifts or signal loss and allowing for optimal performance.
PRODUCER:
HORIBA
PRODUCTION YEAR:
2008
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (177.26 kb)
Mass Spectrometer
CATALOG NAME:
EQP 1000
DESCRIPTION:
The Hiden EQP System is an advanced plasma and gas diagnostic tool with combined high transmission ionenergy analyser and quadrupole mass spectrometer, acquiring both mass spectra at specified ion energies and ion energy distributions of selected plasma ions. The advanced EQP ioniser provides for neutral and radical detection, the electron attachment ionisation feature further enhancing the detection capability for radicals in electronegative plasma chemistries.
PRODUCER:
Hiden Analitical
PRODUCTION YEAR:
2009
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (2808.63 kb)
Optical Microscope
CATALOG NAME:
BX51
DESCRIPTION:
The BX51P polarizing microscope is an investigative tool for the identification of isotropic and anisotropic materials, forensic analysis, thin film/polymer/crystal identification, and extraneous particulates. This device is equipped with a fluorescent lamp wich allows cells analysis.
PRODUCER:
Olympus
PRODUCTION YEAR:
2013
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (5952.7 kb)
Langmuir Probes
CATALOG NAME:
ESPION
DESCRIPTION:
ESPION can be used to study repetitive transients in plasma afterglow. Plasma parameters can be determined at a specific point, or in a specified time window, synchronised to the transients.
PRODUCER:
Hiden Anaytical
PRODUCTION YEAR:
2009
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (309.28 kb)
AU Sputter Coater
CATALOG NAME:
108 auto/SE
DESCRIPTION:
108 auto/SE sputtercoater is design primarily for sputtering conducting layers on to scanning electron microscope samples to prevent charging effects. It uses a planar magnetron sputter target configuration to give efficient high rate sputtering with manual specimen heating.
PRODUCER:
Cressington
PRODUCTION YEAR:
2008
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (57.98 kb)
Low Resolution Spectrograph
CATALOG NAME:
AvaSpec-ULS3648-TEC
DESCRIPTION:
AvaSpec-ULS3648-TEC is used for optical emission spectroscopy.
PRODUCER:
Avantes
PRODUCTION YEAR:
2014
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (91.02 kb)
Low Resolution Spectrograph
CATALOG NAME:
HR4000
DESCRIPTION:
The HR is a spectrometer ideal for application demanding high resolution and fast measurements. It is a popular choice for protein dynamics, laser characterization, gas absorbance, and emission line analysis.
PRODUCER:
Ocean Optics
PRODUCTION YEAR:
2007
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (804.55 kb)
Mixed Signal Oscilloscop
CATALOG NAME:
MSO5104B
DESCRIPTION:
Tektronix MSO5104B oscilloscopes provide exceptional signal fidelity, with 1 GHz bandwidth and 10 GS/s sample rate, along with advanced analysis and math capabilities, on in the lab. Run Windows®-based analysis software right on the oscilloscope. Point and click Visual Triggers enable you to capture complex signals with ease. MSO models include 16 digital timing channels, and are equipped to decode common serial protocols, providing a comprehensive view of the systems.
PRODUCER:
Tektronix
PRODUCTION YEAR:
2015
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (2172.55 kb)
SourceMeter Source Measure Unit 2410
CATALOG NAME:
2410 SMU
DESCRIPTION:
The 2410 Series SourceMeter Source Measure Unit (SMU) Instruments are the industry’s original line of single-channel voltage/current sourcing and measurement instruments. The instrument tightly couples a highly stable DC power source and a true instrument-grade 6½-digit multimeter ranging from +/-1100V and 1A.
PRODUCER:
Keithley
PRODUCTION YEAR:
2010
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (675.14 kb)
RF Power Supplies at 13. 56 MHz (RF generator) 600 W
CATALOG NAME:
CESAR™ Generator
DESCRIPTION:
CESAR™ 136 Generators are Class E Switched Mode Amplifiers for Radio Frequency (CESAR), a new generation of versatile RF power supplies for semiconductor production, and general plasma processing. This 13.56 MHz generator employs parallel excited circuitry in a compact, 19" rack-mountable designs. Typical applications include sputtering, reactive ion etching, RF bias, plasma polymerization, plasma surface treatment, and CO2 laser systems. The CESAR generator incorporates advanced switch mode technology. This highly efficient, resonant switching concept results in reduced energy costs, reduced downtimes, and a longer lifetime for the unit. Designed to regulate power into a broad range of output impedances, the CESAR generator can operate in forward, load, or external power regulation mode.
PRODUCER:
Advanced Energy Industries GmbH
PRODUCTION YEAR:
2010
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (228.09 kb)
Automatic Matching Network (Box)
CATALOG NAME:
Navio™ Digital Matching Network
DESCRIPTION:
The Navio matching network automatically tunes the complex impedance of a plasma to 50 Ω impedance. The digital tuning algorithm and stepper motor drive produce a quicker, more accurate, and repeatable response compared to traditional analog tuning methods—for improved throughput, increased yield, and reduced production costs.
PRODUCER:
Advanced Energy Industries GmbH
PRODUCTION YEAR:
2013
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (2019.12 kb)
RF Power Supplies at 13. 56 MHz (RF generator) 500W + matching Box AM5
CATALOG NAME:
RFPP RF5S + AM5
DESCRIPTION:
500 Watt 13.56 MHz RF Generator and AM5 Matching Box water cooled.
PRODUCER:
RF Power Products Inc.
PRODUCTION YEAR:
2000
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Automatic Impedance Matching Unit
CATALOG NAME:
AMV-1000-EN
DESCRIPTION:
PRODUCER:
Adtec Europe Limited
PRODUCTION YEAR:
2009
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (166.14 kb)
RF Power Supplies at 13. 56 MHz (RF generator) 600W
CATALOG NAME:
RF Plasma Generator AX-1000III
DESCRIPTION:
PRODUCER:
Adtec Europe Limited
PRODUCTION YEAR:
2009
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (188.02 kb)
RF Power Supplies at 13. 56 MHz (RF generator) 1000W
CATALOG NAME:
RF Plasma Generator AX-600III-NV1
DESCRIPTION:
PRODUCER:
Adtec Europe Limited
PRODUCTION YEAR:
2009
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (132.09 kb)
Microscope for contact angle measurement
CATALOG NAME:
CAM 101 – Optical Contact Angle and Surface Tension Meter
DESCRIPTION:
Surface characterization of materials in terms of wettability; Is a fully computer controlled instrument based on capture and automatic analysis of video images for measuring static contact angles and surface free energies.
PRODUCER:
KSV, Finland - Biolin Scientific
PRODUCTION YEAR:
2009
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (259.16 kb)
Deposit setup of carbon material by PAVD from a low pressure RF plasma jet
CATALOG NAME:
Plasma JET
DESCRIPTION:
Deposition of carbon nanomaterials from a low pressure RF plasma jet, generated in Ar and injected with H2/C2H2 mixture. Contact person: Tomy Acsente tomy@infim.ro
PRODUCER:
HomeMade/PLASMA PROCESSES, MATERIALS AND SURFACES group
PRODUCTION YEAR:
2010
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (170.86 kb)
Setup for diagnostics of deposition processes in plasma
CATALOG NAME:
EVAP
DESCRIPTION:
Diagnostics of plasma used for carbon nanomaterials deposition. Data available: ions and electrons densities, ions masses and energies, temperatures in plasma, electron enrgy distributions.
PRODUCER:
INFLPR HomeMade/PLASMA PROCESSES, MATERIALS AND SURFACES group
PRODUCTION YEAR:
2010
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (179.08 kb)
Setup for particle production from a cold plasma jet (PMPPA)
CATALOG NAME:
PMPPA
DESCRIPTION:
PMPPA is a system for particles production by using a radiofrequency (13.56 MHz) low temperature plasma. This system operates at low and atmospheric pressure. The main activity of this system is the production of metallic particle by using the physical vapour deposition method. Contact person: Tomy Acsente tomy@infim.ro
PRODUCER:
HomeMade/PLASMA PROCESSES, MATERIALS AND SURFACES group
PRODUCTION YEAR:
2012
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (149.37 kb)
Experimental system for thin films deposition with PVD/PECVD plasma sources and automatic operating mode
CATALOG NAME:
SFERACOM
DESCRIPTION:
Utilisation: thin films deposition and composite materials synthesis by radiofrequency enhanced chemical vapor deposition combined with magnetron sputtering , starting from various solid targets and various organic precursors. Contact person: Veronica Satulu veronica.satulu@infim.ro
PRODUCER:
HomeMade/PLASMA PROCESSES, MATERIALS AND SURFACES group
PRODUCTION YEAR:
2015
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (154.07 kb)
Cold Plasma Jets
CATALOG NAME:
Cold Plasma Jets
DESCRIPTION:
Atmospheric pressure plasma sources are used for local and in line treatment of surfaces, modification of surface properties (weabilitty, roughness, chemistry) of materials sensitive to thermal damage, cleaning surfaces, plasma in liquid treatment. Contact person: Tomy Acsente tomy@infim.ro
PRODUCER:
National Institute for Lasers Plasma and Radiation Physics (NILPRP) - Plasma Processes, Materials and Surfaces (PPMS) Group -homemade equipment
PRODUCTION YEAR:
2008
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (154.97 kb)
Setup for plasma investigations by shadowgrapy
CATALOG NAME:
DESCRIPTION:
Used for investigation of gas flows exiting plasma sources at atmospheric pressure. -150MM f/4 parabolic mirror, light bulb, optical table. Contact person: Tomy Acsente tomy@infim.ro
PRODUCER:
National Institute for Lasers Plasma and Radiation Physics (NILPRP) - Plasma Processes, Materials and Surfaces (PPMS) Group -homemade equipment
PRODUCTION YEAR:
2015
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Monofilamentary plasma source
CATALOG NAME:
DESCRIPTION:
Atmospheric pressure plasma source is used for bacteria inactivation in liquids, decontamination, study of plasma in liquid interactions. Contact person: Tomy Acsente tomy@infim.ro
PRODUCER:
National Institute for Lasers Plasma and Radiation Physics (NILPRP) - Plasma Processes, Materials and Surfaces (PPMS) Group -homemade equipment
PRODUCTION YEAR:
2013
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (205.39 kb)
TVA deposition equipment
CATALOG NAME:
DESCRIPTION:
High voltage plasma, Vacuum 10-6 torr, no buffer gas, low temperature deposition.
PRODUCER:
National Institute for Lasers, Plasma and Radiations Physics, Low Plasma Temperature Laboratory
PRODUCTION YEAR:
2009
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Spherical macro-particle synthesizer
CATALOG NAME:
DESCRIPTION:
Particle diameter: 30 - 1000 microns.
PRODUCER:
National Institute for Lasers Plasma and Radiation Physics
PRODUCTION YEAR:
2010
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Sandblaster
CATALOG NAME:
DESCRIPTION:
PRODUCER:
UK
PRODUCTION YEAR:
2015
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Setup for nanoparticle synthesis using a MSGA cluster source
CATALOG NAME:
DESCRIPTION:
The core of the experimental setup consists in a magnetron sputtering gas aggregation cluster source (MS-GAS) mounted on a state of the art vacuum chamber dedicated for thin films deposition using plasma processes. The nanoparticles are obtained by condensation in an inert gas flow of the metallic vapours obtained by magnetron sputtering. Comtact person: Acsente Tomy / acsente.tomy@inflpr.ro
PRODUCER:
Home made /PLASMA PROCESSES, MATERIALS AND SURFACES group
PRODUCTION YEAR:
2014
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (576.36 kb)
Residual gas analyzer with closed ion source
CATALOG NAME:
CIS100 RGA
DESCRIPTION:
With better than 1 ppm detection limit, direct sampling at mTorr pressure, and a user-friendly Windows software package, the CIS100 systems is usefullfor on-line process monitoring and control, verification of process gas purity at the point of use, high-vacuum residual gas analysis, and process equipment leak checking. Contact person: Acsente Tomy / acsente.tomy@inflpr.ro
PRODUCER:
Stanford Research Systems
PRODUCTION YEAR:
2016
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Laser Diode Absorption Spectroscopy Setup
CATALOG NAME:
SYST DL100
DESCRIPTION:
The system include: i)Extended cavity laser diode (DL100); ii) electronic control unit (DC110) and iii)optical setup for performing absorption spectroscopy in the wavelength range 765-790nm and 852nm. Contact person: Acsente Tomy / acsente.tomy@inflpr.ro
PRODUCER:
Toptica
PRODUCTION YEAR:
2010
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (849.06 kb)
Digital signal processing lock-in amplifier
CATALOG NAME:
SR830
DESCRIPTION:
Allows detection and amplification of very small signals using the lock-in technique. It is usefull for detection of weak absorption spectroscopy signals. Contact person: Acsente Tomy / acsente.tomy@inflpr.ro
PRODUCER:
Stanford Research Systems
PRODUCTION YEAR:
2011
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (727.05 kb)
Optical chopper
CATALOG NAME:
SR540
DESCRIPTION:
The chopper is usefull for lock-in detection of low absorption spectroscopy signals, in single and dual beam experiments. The chopping frequencies are in between 4 Hz to 3.7 kHz. Contact person: Acsente Tomy / acsente.tomy@inflpr.ro
PRODUCER:
Stanford Research Systems
PRODUCTION YEAR:
2011
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (376.89 kb)
Fabry-Perot-Interferometer
CATALOG NAME:
FPI 100-0750-3V0
DESCRIPTION:
The FPI 100 is a confocal, scanning Fabry-Perot interferometer with a built-in photodetector unit. The working wavelengths domain is 615...885 nm, with a free spectral range FSR of 1.0 GHz. It is usefull for calibrating the wavelength scale during laser diode absorption spectroscopy experiments. Contact person: Acsente Tomy / acsente.tomy@inflpr.ro
PRODUCER:
Toptica
PRODUCTION YEAR:
2010
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (306.22 kb)
Thickness Monitor
CATALOG NAME:
TM-400
DESCRIPTION:
The Thickness Monitor allows the control of the vacuum film deposition process by providing a direct display of film thickness and deposition rate during deposition. Contact person: Acsente Tomy / acsente.tomy@inflpr.ro
PRODUCER:
Inficon
PRODUCTION YEAR:
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (2156.62 kb)
Direct current pulse power controller.
CATALOG NAME:
SPIK2000A
DESCRIPTION:
The pulse power controller operate using two DC power supplies with floating outputs to power the plasma in a dual magnetron deposition system, their cathodes being alternatively powered (at a frequency up to 50 kHz). Contact person: Acsente Tomy / acsente.tomy@inflpr.ro
PRODUCER:
Melec GmbH
PRODUCTION YEAR:
2013
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Download data sheet file (1832.63 kb)
Thermionic Vacuum Arc System
CATALOG NAME:
DESCRIPTION:
PRODUCER:
Home Made, Heizinger Power Supplies, Bosch-Rexroth Control systems
PRODUCTION YEAR:
2007
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Thermal Desorprion Spectrometry
CATALOG NAME:
DESCRIPTION:
PRODUCER:
Pfeiffer Mass Spectrometer, Heizinger Power Supplies
PRODUCTION YEAR:
2007
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
10.001 € – 50.000 €
DATA SHEET:
Dual Reactive Magnetron Sputtering System
CATALOG NAME:
DESCRIPTION:
PRODUCER:
Agilent Vacuum System, Genoa Magnetrons, Technics Power Supplies, SKC Flow Controllers
PRODUCTION YEAR:
2015
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
50.001 € - 100.000 €
DATA SHEET:
Tribometer
CATALOG NAME:
DESCRIPTION:
PRODUCER:
CSM Instruments Tribometer, Dell Computer
PRODUCTION YEAR:
2006
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
OMA
CATALOG NAME:
DESCRIPTION:
Contact person: Cristian P. LUNGU cristian.lungu@inflpr.ro
PRODUCER:
Ocean Optics
PRODUCTION YEAR:
2012
COMMISSIONING DATE:
PRICE RANGE (at the time of purchase)
DATA SHEET:
Phone:
+40-21-4574550
Fax:
Atomistilor
,
409
,
Magurele
077125
,
Ilfov
Romania
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